Method of manufacturing a thin-film pattern on a substrate
US5259926A · kind A · utility
253Cited by
6References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 24, 1992 |
| Grant date | Nov 9, 1993 |
| Priority date | — |
| Expiry date | Sep 24, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/942
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Disclosed is an improvement in a thin-film pattern manufacturing method which includes the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching. According to the improvement, the mask is manufactured by forming a layer of an organic resin on the thin film on the substrate and by forming the organic resin layer in the desired pattern by a mechanical forming member. In another embodiment, the organic resin is directly formed or moulded on the thin film by a forming or moulding member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.