Photoenhanced diffusion patterning for organic polymer films
US5260163A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 1992 |
| Grant date | Nov 9, 1993 |
| Priority date | — |
| Expiry date | May 7, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/4644
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
1. A method for making patterns in organic polymer films comprising the following steps: PA1 (a) applying to a substrate an unpatterned photosensitive first layer comprising (a1) an organic polymeric binder, (a2) an ethylenically unsaturated monomer and (a3) a photoinitiating system; PA1 (b) applying to the photosensitive first layer a second patterning layer comprising (b1) radiation-opaque material which prevents the transmission of actinic radiation and (b2) a diffusing agent which is capable of changing the dispersibility of the photosensitive material in a predetermined eluant; PA1 (c) exposing the first photosensitive layer to actinic radiation to effect photohardening of the photosensitive first layer in those areas not covered by the second patterning layer; PA1 (d) effecting patterned diffusion of the diffusing agent into the underlying first photosensitive layer; and PA1 (e) removing the areas of the first photosensitive layer which are dispersible in the predetermined eluant, by washing them with the eluant; wherein step (c) is carried out before, after or simultaneously with step (d).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.