Patent · US Expired

Method of producing microstructures having regions of different structural height

US5260175A · kind A · utility

24Cited by
6References
5Claims
0Family size

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Key dates

Filing dateMar 31, 1992
Grant dateNov 9, 1993
Priority date
Expiry dateMar 31, 2012

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/168
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of producing microstructures having regions of different structural height includes providing a layer of positive resist material that is sensitive to X-ray radiation with microstructures on a side facing a source of X-rays. Using a mask, the layer of a positive resist material is partially irradiated with the X-rays. The irradiated regions are removed with the aid of a developer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.