Method of producing microstructures having regions of different structural height
US5260175A · kind A · utility
24Cited by
6References
5Claims
0Family size
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Key dates
| Filing date | Mar 31, 1992 |
| Grant date | Nov 9, 1993 |
| Priority date | — |
| Expiry date | Mar 31, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of producing microstructures having regions of different structural height includes providing a layer of positive resist material that is sensitive to X-ray radiation with microstructures on a side facing a source of X-rays. Using a mask, the layer of a positive resist material is partially irradiated with the X-rays. The irradiated regions are removed with the aid of a developer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.