Patent · US Expired

Radiation-sensitive polymer having acid labile groups and onium salt groups

US5260410A · kind A · utility

78Cited by

0References

5Claims

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Inventor

Reinhold Schwalm · Monsheim, DE

Key dates

Filing date	Mar 2, 1992
Grant date	Nov 9, 1993
Priority date	—
Expiry date	Mar 2, 2012

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/039
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.