Coating porous materials with metal oxides and other ceramics by MOCVD
US5262199A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1992 |
| Grant date | Nov 16, 1993 |
| Priority date | — |
| Expiry date | Apr 17, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2111/0081
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Metal organic chemical vapor deposition (MOCVD) is used to form a layer of a metal oxide on the surfaces and within the pores of a porous ceramic material. The metal oxide is formed from one or more inexpensive metal organic precursors which permeate the pores of the substrate as a vapor. Surface reactions on the heated substrate convert the metal organic precursors to their metal oxide. The technique has particular utility in creating catalysts with very large surface areas and in providing a protective coating on ceramic materials that prevents or reduces damage from hostile environments. In a preferred embodiment, aluminum isopropoxide, [(CH.sub.3).sub.2 CHO].sub.3 Al, and titanium ethoxide, Ti(C.sub.2 H.sub.5 O).sub.4, are used simultaneously or successively as precursors to generate a Al.sub.2 TiO.sub.5 coating on a porous ceramic substrate such as SiC or porous refractory cement candle filters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.