Low temperature process for converting silica precursor coatings to ceramic silica coatings by exposure to ammonium hydroxide or an environment to which water vapor and ammonia vapor have been added
US5262201A · kind A · utility
50Cited by
7References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 1990 |
| Grant date | Nov 16, 1993 |
| Priority date | — |
| Expiry date | Jun 4, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This invention relates to a method of forming a ceramic coating on a substrate. The method comprises coating the substrate with a solution comprising a solvent and a silica precursor followed by evaporating the solvent to form a preceramic coating. The preceramic coating is then exposed to an environment comprising ammonium hydroxide or an environment to which water vapor and ammonia vapor have been added to facilitate conversion of the silica precursor to the ceramic coating. The preceramic coating is then subjected to a temperature sufficient to facilitate conversion of said preceramic coating to a ceramic coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.