Apparatus for ion-plasma machining workpiece surfaces including improved decelerating system
US5262611A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 1991 |
| Grant date | Nov 16, 1993 |
| Priority date | — |
| Expiry date | May 30, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30472
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus comprises a vacuum chamber (1) accommodating a source (2) of ion flow directed toward the surface being machined, and a system (3) for decelerating ion flow. The system (3) includes a shielding electrode (5) positioned before the workpieces (4) and having a hole (7) for the passage of ion flow, and at least one decelerating electrode (6) electrically insulated from the walls of the vacuum chamber (1) and shielding electrode (5). The decelerating electrode (6) has the form of a magnetic element whose magnetization vector (M) is substantially congruent with the workpiece surface being machined. In addition, line (13) of electron drift current is closed in a direction transverse of the direction of the ion flow.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.