Apparatus and process for glow discharge comprising substrate temperature control by shutter adjustment
US5264256A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 1992 |
| Grant date | Nov 23, 1993 |
| Priority date | — |
| Expiry date | Sep 8, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is a method and apparatus for effecting glow discharge comprising an elongated electrically conductive glow bar electrode, means for applying a potential to the glow bar electrode, thereby generating ions, means for creating a flow of ions from the glow bar electrode to a second electrode, and a shield situated to block partially the flow of ions between the glow bar electrode and the second electrode, said shield having a plurality of apertures through which ions can flow between the glow bar electrode and the second electrode, each aperture having associated therewith at least one shutter, said shutters being capable of at least partially blocking the flow of ions through the apertures, each shutter individually movable to a plurality of positions to adjust the flow of ions through the apertures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.