Integrated microsystem
US5265113A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 1991 |
| Grant date | Nov 23, 1993 |
| Priority date | — |
| Expiry date | Mar 26, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/02423
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Integrated microsystem comprising electrical and nonelectrical, particularly optical functions in a laser system, wherein a base comprising anisotropically etchable semiconducting material on which etching structures for receiving optical and/or electro-optical and electrical/electronic and/or fluidic and/or mechanical elements or their mountings are arranged in predetermined distances and/or levels, as well as integrated switching circuits, and that at least a part of the optical, electro-optical or mechanical elements or their mounting is controllable and movable electrically in such a way that its position relative to the base is actively changeable, and that at least one sensor is provided which determines the effect of the position change on the function of at least a part of a microsystem and supplies a signal for repeated readjustment (self-adjusting) of optical elements and their mounting.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.