Method of making a thin-film transducer ink jet head
US5265315A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 20, 1990 |
| Grant date | Nov 30, 1993 |
| Priority date | — |
| Expiry date | Nov 20, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49401
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A thin-film transducer ink jet head is prepared by oxidizing one surface of a silicon wafer to provide a dielectric layer, forming electrodes on the layer by photoresist processing techniques, depositing one or more layers of PZT material to provide a thin-film piezoelectric layer having a thickness in the range of 1-25 microns, forming another pattern of electrodes on the surface of the PZT layer by photoresist techniques, and selectively etching the silicon substrate in the region of the electrodes to provide an ink chamber. Thereafter, an orifice plate is affixed to the substrate to enclose the ink chambers and provide an ink orifice for each of the chambers. An ink jet head having chambers 3.34 mm long by 0.17 mm wide by 0.15 mm deep and orifices spaced by 0.305 mm is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.