Microwave-powered plasma-generating apparatus and method
US5266146A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1991 |
| Grant date | Nov 30, 1993 |
| Priority date | — |
| Expiry date | Sep 20, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3266
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma-generating apparatus has a plasma discharge chamber having a plasma-generation region. Microwave energy is applied, while introducing plasma-forming gas, and a magnetic field is applied to the plasma-generation region by an electromagnetic coil extending around the chamber. To enhance the field in the plasma-generation region while reducing it outside said region, and a permanent magnet arrangement is at least partly located radially within the coil so as to provide a unidirectional magnetic field which extends through the whole of the plasma-generation region as seen in radial cross-section and is oriented in the axial direction of the coil.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.