Method for producing flat CVD diamond film
US5270077A · kind A · utility
32Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1991 |
| Grant date | Dec 14, 1993 |
| Priority date | — |
| Expiry date | Dec 13, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition method for producing a flat diamond film substantially free of cracks by forming the diamond film on the surface of a substrate having a convex growth surface wherein the radius of curvature is matched with the tensile stress within the diamond coating produced to compensate for distortion when the film is separated from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.