Plasma producing gas for plasma projection of metallic oxide
US5271869A · kind A · utility
4Cited by
2References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1991 |
| Grant date | Dec 21, 1993 |
| Priority date | — |
| Expiry date | Mar 28, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/42
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The plasma producing gas consists of a ternary mixture of helium, argon and hydrogen and contains at least about 10% hydrogen, typically 30 to 70% helium, 10 to 50% argon and 10 to 25% hydrogen, preferably 20% (.+-.5%) hydrogen. Use for the plasma projection of metallic oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.