Apparatus for vacuum deposition of sublimative substance
US5272298A · kind A · utility
9Cited by
6References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 31, 1991 |
| Grant date | Dec 21, 1993 |
| Priority date | — |
| Expiry date | Dec 31, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/243
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vacuum deposition apparatus has a slit-like nozzle formed in a receptacle accommodating a vacuum deposition material to effect uniform vacuum deposition of the material in the direction of width of a moving base material. The receptacle is made of graphite. An inductively heated body is disposed at the upper part of the receptacle and is provided with the small slit-like nozzle. The nozzle extends in the direction of width of the moving base material. The vaporized vacuum deposition material passes through the nozzle and is deposited uniformly in the direction of width of the moving base material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.