Capacitively coupled radiofrequency plasma source
US5274306A · kind A · utility
45Cited by
13References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1992 |
| Grant date | Dec 28, 1993 |
| Priority date | — |
| Expiry date | Jul 29, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A pair of dissimilarly-sized electrodes are driven by a radiofrequency source to create a plasma. A magnetic field is oriented to be parallel to a surface area on the smaller electrode. The field strength increases to either side of that smaller electrode. As shown, ions are electrostatically accelerated out of the plasma, but they instead may be accelerated magnetically, electrons may in the alternative be extracted or there may be no accelerating mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.