Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias
US5275850A · kind A · utility
48Cited by
10References
2Claims
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Key dates
| Filing date | Sep 4, 1991 |
| Grant date | Jan 4, 1994 |
| Priority date | — |
| Expiry date | Sep 4, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A magnetic disk comprising a nonmagnetic substrate, a metallic thin film magnetic layer provided on the substrate and a hard carbon protective layer provided on the magnetic layer, the hard carbon protective layer containing at least one metal element of silicon, germanium, tin and lead, or further containing fluorine, formed by bias plasma CVD treatment, has a high attrition resistance, a high peeling resistance and a high crack resistance or further a higher corrosion resistance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.