Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
US5275907A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 23, 1992 |
| Grant date | Jan 4, 1994 |
| Priority date | — |
| Expiry date | Jul 23, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.