Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
US5278030A · kind A · utility
4Cited by
16References
7Claims
0Family size
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Key dates
| Filing date | Nov 6, 1990 |
| Grant date | Jan 11, 1994 |
| Priority date | — |
| Expiry date | Nov 6, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developer liquid for image-wise exposed radiation sensitive compositions comprises ethyl hexyl sulphate, a surfactant, and alkaline material such that the pH is al least 12 and preferably at least 13.5. The developer liquid may additionally include a water soluble carboxylic acid salt such as sodium octanoate and the sodium salt of ethylene diamine tetra acetic acid. Such developer liquids can be formulated for use with both positive-working and negative-working compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.