Apparatus for determining the concentration of a gas in a vacuum chamber
US5283435A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 1992 |
| Grant date | Feb 1, 1994 |
| Priority date | — |
| Expiry date | May 12, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0036
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for determining the concentration of a gas in a vacuum chamber is described. Internal to the vacuum chamber are one or more cathodes. The chamber is fed via a gas inlet and is connected to a separate measurement chamber for accommodating a measuring device via a connecting line between the two chambers. The connecting line in conjunction with a pumping means produces a pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber. One end of the connecting line, located within the vacuum chamber terminates directly in the central region of a cathode surfaces facing the interior of the chamber, and the length, as well as the cross section of the connecting line being dimensioned so that the pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber, is precisely that required for measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.