Metal vapor laser apparatus and method
US5283800A · kind A · utility
7Cited by
9References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 1992 |
| Grant date | Feb 1, 1994 |
| Priority date | — |
| Expiry date | Mar 26, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/031
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metal vapor laser apparatus has a gas supply device. The device supplies at least two kinds of gases to a container of the laser apparatus controlled individually. One of the gases is selected from the group of the molecular gas such as hydrogen gas, the other is selected from the group of rare gas such as neon gas. By adjusting the mixture ratio of these gases, the laser beam output is obtained efficiently. The molecular gas should be supplied when a metal lump, such as copper, arranged in the container is melting.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.