Anti-contaminating adsorbed film covalently bonded to a substrate surface through -Si- groups
US5284707A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 1991 |
| Grant date | Feb 8, 1994 |
| Priority date | — |
| Expiry date | Dec 24, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
This invention provides for an anti-contaminating film which is adsorbed to a substrate surface. The film contains a --Si-- group and fluorocarbon group. The --Si-- group is covalently bonded to the substrate surface. It also provides a method of forming an anti-contaminating film on a hydrogen active substrate surface by contacting the substrate surface with a non-aqueous solution, containing a surface active material having fluorocarbon groups and chlorosilane groups, the substrate surface having active hydrogen groups, removing unreacted surface active material remaining on the substrate by washing the substrate with a non-aqueous organic solution for making a monomolecular precursor film, reacting chlorosilane groups unreacted in the adsorbed monomolecular precursor film with water after the removing step, and drying the adsorbed monomolecular film. The above washing step with the non-aqueous organic solution was omitted, and a fluorocarbon polymer film was formed to the substrate surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.