Radiation-sensitive mixture and use thereof

US5284734A · kind A · utility

Assignee

• BASF SE

Inventors

• Rainer Blum · Ludwigshafen, DE
• Gerd Rehmer · Beindersheim, DE
• Hans Schupp · Worms, DE

Key dates

• Filing date: Sep 26, 1989
• Grant date: Feb 8, 1994
• Expiry date: Sep 26, 2009

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08L79/08
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Radiation-reactive mixtures suitable for producing insulating layers and printed circuits are composed of certain precursors for preparing polyimides polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones and aryl-containing carbonyl compounds which when excited by UV radiation are capable of hydrogen abstraction, these mixtures undergoing solubility differentiation on irradiation with actinic light.