Method for manufacturing an oxide superconductor thin film
US5284824A · kind A · utility
3Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1992 |
| Grant date | Feb 8, 1994 |
| Priority date | — |
| Expiry date | Jun 23, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/734
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for manufacturing an oxide superconductor film is disclosed, which comprises the steps of: preparing a substrate; depositing an oxide superconductor film on said substrate by chemical vapor deposition (CVD); and supplying excited oxygen to or near a film deposition site on said substrate during the deposition of said film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.