Process for purifying vinylphenol polymers for use as photoresist materials
US5284930A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 1992 |
| Grant date | Feb 8, 1994 |
| Priority date | — |
| Expiry date | Nov 23, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/04
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Recently, vinylphenol polymers have received special attention as materials for photoresists, since these materials have excellent transmittance of deep ultraviolet light in the neighborhood of 248 nm. Although particularly useful in this regard, vinylphenol polymers usually contain metal impurities, while photoresists must have high transmittance and extremely low metal content. As a result, vinylphenol polymers satisfying these requirements have not been available on industrial scale. In the present invention, a process for producing such purified vinylphenol polymers, both economically and easily, is realized. In the process of this invention, the vinylphenol polymer solution is hydrogenated and the hydrogenated solution is contacted with a strongly acidic cation exchange resin. In this way, substantially metal-free vinylphenol polymers are obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.