Exposure apparatus
US5285488A · kind A · utility
28Cited by
3References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 10, 1992 |
| Grant date | Feb 8, 1994 |
| Priority date | — |
| Expiry date | Nov 10, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/702
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.