Submicron Josephson junction and method for its fabrication
US5286336A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1992 |
| Grant date | Feb 15, 1994 |
| Priority date | — |
| Expiry date | Nov 2, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/832
Abstract
A Josephson junction and a method for its fabrication in which a laminated junction layer is formed in situ on the side edge of a base electrode contact. The laminated junction layer forms the Josephson junction of the present invention and includes an insulating or barrier layer sandwiched between a superconducting base electrode and a superconducting counter electrode. The Josephson junction is formed on the side edge of the base electrode contact to allow very small junction areas to be fabricated using conventional optical lithographic techniques, such as photolithography. The laminated junction layer is formed in situ, with the three layers of the laminated junction layer being formed successively without removing the device from the controlled atmosphere of the deposition system, to prevent contamination of the junction region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.