Method for treating an oxide coating

US5286531A · kind A · utility

Assignees

• Leybold GmBH · DE
• TOPPAN PRINTING CO., LTD. · JP

Inventors

• Thomas Krug · Worms, DE
• Klemens Ruebsam · Bad Orb, DE
• Andreas Meier · Wilhermsdorf, DE
• Gerhard Steiniger · Ronneburg, DE
• Mitsuru Kano · Osaki, JP
• Noboru Sasaki · Yokohama, JP
• Takashi Miyamoto · Tokyo, JP
• Mamoru Sekiguchi · Tokyo, JP

Key dates

• Filing date: Aug 3, 1992
• Grant date: Feb 15, 1994
• Expiry date: Aug 3, 2012

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/5853
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a method for the aftertreatment of an oxide coating, and specifically an SiO.sub.x coating on a synthetic film. In this aftertreatment the oxide coating is exposed to a plasma whose particles effect positive changes of the oxide coating.