Process for plasma deposition of a carbon rich coating
US5286534A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 1993 |
| Grant date | Feb 15, 1994 |
| Priority date | — |
| Expiry date | Mar 31, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/8408
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention provides a magnetic recording medium that includes a polymeric flexible substrate and a magnetic layer coating thereon, with a binderless carbon rich layer adhered to the magnetic layer. The present invention also provides a process for the plasma deposition of the carbon rich coating onto a magnetic medium comprising the steps of: PA0 a. providing a magnetic medium in a vacuum chamber; PA0 b. generating carbon rich plasma in the vacuum chamber by injecting a plasma gas suitable to provide a carbon rich coating into an elongated hollow cathode; and providing a sufficient voltage to create and maintain plasma; and maintaining a vacuum in the vacuum chamber sufficient for the plasma; and PA0 c. exposing the magnetic medium to the plasma while the magnetic medium is influenced by a radio frequency bias electrode to accelerate the plasma towards the magnetic medium and deposit the carbon rich coating on the magnetic medium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.