Optical fine processing apparatus
US5288382A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1993 |
| Grant date | Feb 22, 1994 |
| Priority date | — |
| Expiry date | Mar 29, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F3/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An optical fine processing apparatus for forming a structure having a high aspect ratio even on a workpiece having high heat conductivity. Light, such as a laser beam, is irradiated onto the workpiece in an electrolytic solution through a light guide to deposit a substance such as a metal or a polymer. A plurality of removal electrodes are allowed to have an electric potential for removing a part of the deposited substance. The removal electrodes are disposed in a rotation ring which is rotatable about the optical axis of the irradiating light onto the sample so as to adjust the width of a predetermined pattern to be scraped by changing the rotation angle of the removal electrodes with respect to the optical axis. By scanning the light guide and the removing electrodes above the workpiece surface, it is possible to form any desired pattern on the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.