High resolution optical microscope and irradiation spot beam-forming mask
US5291012A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Apr 23, 1992 |
| Grant date | Mar 1, 1994 |
| Priority date | — |
| Expiry date | Apr 23, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/125
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high resolution optical microscope consists of an irradiation spot beam-forming mask which is disposed in a dark or a bright field, whereby a diameter of each of a plurality of irradiation spot beams onto an object to be measured is made smaller than a size of the object, beyond Rayleigh's resolution limit. In the irradiation spot beam-forming mask, a phase array is regularly disposed in a two-dimensional direction so that neighboring portions of each of the irradiation spot beams are optically phase-shifted from one another at 180.degree.. Thus, a wide observation surface and a prompt measurement can be performed with a high resolution of 0.1 .mu.m or less, far beyond Rayleigh's resolution limit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.