Patent · US Expired

Semiconductor device and method of fabricating semiconductor device

US5291065A · kind A · utility

61Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 14, 1992
Grant dateMar 1, 1994
Priority date
Expiry dateDec 14, 2012

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3025
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A patterned first metal plate (310)is joined to an upper surface of a first ceramic substrate (301), and a second metal plate (330) is joined to an emitter electrode (310E) of the first metal plate (310) through a second ceramic substrate (320). Power devices (4) are mounted on a collector electrode (310C) of the first metal plate (310), and control devices (5) are mounted on the second metal plate (330). The emitter electrode (310E) of a metal layer lies between a high-voltage circuit having the first metal plate (310) and power devices (4) and a control (low-voltage) circuit having the control devices (5) and second metal plate (330). The emitter electrode (310E) serves as a shielding material, and the electrostatic shielding effect prevents noises applied to the high-voltage circuit from being led to the control circuit, so that the faulty operations of the control devices (5) are prevented and the reliability of the semiconductor device is improved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.