Method for control of photoresist develop processes
US5292605A · kind A · utility
55Cited by
28References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 7, 1992 |
| Grant date | Mar 8, 1994 |
| Priority date | — |
| Expiry date | Oct 7, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for the control of photoresist develop processes employing multiple spray-puddle steps in which process changes other than time, such as endpoint are used to determine the length of the spray and puddle steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.