High finesse holographic fabry-perot etalon and method of fabricating
US5293272A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1992 |
| Grant date | Mar 8, 1994 |
| Priority date | — |
| Expiry date | Aug 24, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high finesse holographic Fabry-Perot etalon and method of making a high finesse holographic Fabry-Perot etalon is disclosed. Particularly, a holographic Fabry-Perot etalon which achieves high finesse despite non-flat interfaces between the etalon media is presented. In a preferred method of fabricating a high finesse Fabry-Perot etalon, single step recording of both holograms simultaneously, with the spacer and substrates in place, is employed which preserves full phase synchronization between the holograms. In spite of imperfections or irregularities of the interface surfaces of the substrates or spacers, the holographic fringes in the holograms remain flat even for slightly different refractive indices between the various media. The position and flatness of the fringes remains similar to perfect Fabry-Perot etalon structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.