Surface cleaning using an argon or nitrogen aerosol

US5294261A · kind A · utility

Assignees

• AIR PRODUCTS AND CHEMICALS, INC. · US
• International Business Machines Corporation · US

Inventors

• Wayne Thomas McDermott · Fogelsville, US
• Richard Carl Ockovic · Northampton, US
• Jin J. Wu · Hopewell Junction, US
• Douglas W. Cooper · Ramsey, US
• Alexander Schwarz · Soest, DE
• Henry L. Wolfe · Pleasant Valley, US

Key dates

• Filing date: Nov 2, 1992
• Grant date: Mar 15, 1994
• Expiry date: Nov 2, 2012

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B24C3/322
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon or nitrogen particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.