Method of monitoring metal ion content in plating baths

US5298131A · kind A · utility

Assignee

• Hughes Aircraft Company · US

Inventors

• Bruce M. Eliash · Los Angeles, US
• Frank A. Ludwig · Homberg (Efze), DE
• Nguyet H. Phan · Los Angeles, US
• Vilambi NRK Reddy · Cranbury, US

Key dates

• Filing date: May 28, 1993
• Grant date: Mar 29, 1994
• Expiry date: May 28, 2013

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S204/08
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method of monitoring in-tank and on-line metal ion content within a plating bath. The method involves the steps of applying a pretreatment signal to a sensing electrode positioned within the plating bath, applying a sweep signal to the pretreated sensing electrode, and measuring the voltammetric peak current of the resultant response signal. The voltammetric peak current is proportional to the metal ion content of the plating bath. The method complements and is easily integrated with known voltammetric techniques for analysis of trace and major constituents, and is thus an integral part of an efficient overall plating bath analysis system.