Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
US5298939A · kind A · utility
102Cited by
25References
16Claims
0Family size
Inventors
Key dates
| Filing date | Nov 4, 1991 |
| Grant date | Mar 29, 1994 |
| Priority date | — |
| Expiry date | Nov 4, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7057
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.