Apparatus for and method of producing ion beams
US5300785A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 4, 1992 |
| Grant date | Apr 5, 1994 |
| Priority date | — |
| Expiry date | Jun 4, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus (28) for implanting ions into a target element (26) comprising a circular array of hot cathode, are discharge, ion sources (29) mounted on a rotary carousel (13) or a linear mechanism. An annular rotary support (15) around the carousel supports a plurality of extraction electrodes (18). A housing (20,23) defines an outlet path (32) for the ion beam from the ion source (29). The ion beam is directed through a beam analyzer (24) and through accelaration stages (25) to means (27) for scanning beam relative to the target (26) to be implanted. The carousel (13) and the annual support (15) can both be rotated, so as to bring into cooperating relationship required combinations of ion source (29) and extraction electrode (18).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.