Deposition process of a ceramic coating on a metallic substrate
US5302422A · kind A · utility
36Cited by
5References
12Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Nov 13, 1992 |
| Grant date | Apr 12, 1994 |
| Priority date | — |
| Expiry date | Nov 13, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The object of the present invention is a deposition process of a coating of the ceramic type based on carbides, nitrides, or carbonitrides of metallic elements such as Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf, Ta, Ti, Nb and Fe in which the coating of the ceramic type is deposited at low temperature in the vapour phase on a metallic substrate from organo-metallic precursors wherein, prior to this deposition in the vapour phase and without subsequent placing in contact with an oxidizing and/or polluting atmosphere, a reactive ionic pickling is carried out in a reducing atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.