Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5306408A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 29, 1992 |
| Grant date | Apr 26, 1994 |
| Priority date | — |
| Expiry date | Jun 29, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/325
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for coating high temperature resistant, electrically-conductive, ceramic compounds, such as titanium carbides and diborides, onto an organic substrate, which may be an organic resin matrix composite. The apparatus basically comprises a vacuum arc plasma generator, a high-voltage insulated substrate holding table and a plasma channel. The plasma generator includes a vacuum chamber having a cylindrical cathode of the material to be deposited, surrounded by a ceramic insulator which is in turn surrounded by a metal trigger ring in contact with a trigger electrode. When a vacuum arc discharge is initiated, a plasma flows outwardly from the cathode through a hole in an adjacent anode and into a drift tube. The drift tube has a plurality of magnets around the tube exterior to push the plasma away from the tube, maintain a uniform plasma density and guide the plasma towards a substrate on a movable high voltage insulated substrate support. The cathode material is nearly 100% ionized, giving the ions impinging on the organic substrate sufficient kinetic energy to react with and adhere tightly to the target substrate without additional heating. The amount of kinetic e…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.