Reactor vessel for manufacture of superconducting films
US5306699A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 25, 1991 |
| Grant date | Apr 26, 1994 |
| Priority date | — |
| Expiry date | Oct 25, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/786
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and reactors are described for the production of high temperature superconductor films on a variety of substrates, particularly those films which include volatile components during their manufacture. The reactors are particularly useful for producing films containing thallium. The reactors provide for relatively low volume cavities in which the substrate is disposed, and control of the thallium oxide overpressure during the processing. In a preferred embodiment, one or more holes or apertures are made in the reactor to permit thallium and thallium oxide to controllably leak from the reactor. For manufacture of double sided superconducting films, a reactor is used having top and bottom plates each with one or more holes in them. Uniform high temperature superconducting films are obtained while inhibiting reaction between the substrate and superconducting film during the processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.