Preparation of a firm bond between copper layers and aluminum oxide ceramic without use of coupling agents
US5308463A · kind A · utility
16Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 1992 |
| Grant date | May 3, 1994 |
| Priority date | — |
| Expiry date | Sep 11, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for preparing a firm bond between copper layers and aluminum oxide ceramic without coupling agent layers wherein the aluminum oxide ceramic is subjected to a plasma etching process in a first vacuum chamber in the presence of oxygen and immediately thereafter plated with copper by sputtering in a second vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.