Photosensitive diazo resins and resin compositions for lithographic printing having a quaternary ammonium salt-containing group
US5308735A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 1992 |
| Grant date | May 3, 1994 |
| Priority date | — |
| Expiry date | Oct 29, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a photosensitive diazo resin for lithographic printing represented by the formula: ##STR1## wherein X.sup.- is a counter anion, Y is a divalent bonding group selected from the group consisting of --NH--, --S-- and --O--, R.sub.1, R.sub.2 and R.sub.3 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and an alkoxy group, R.sub.4 and R.sub.5 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and a phenyl group, 1 and m are integers which satisfy the relation: EQU 1+m=2 to 100, 1/m=30 to 99/1 to 70 and A is a quaternary ammonium salt-containing group represented by the formula: ##STR2## (wherein B is a straight or branched divalent C.sub.1-10 alkyl group which bonds to an aromatic ring by a group selected from the group consisting of --CH.sub.2 --, --CO--, --O--, --S-- and --N--, and R.sub.6, R.sub.7 and R.sub.8 are groups which are independently selected from the group consisting of hydrogen and a C.sub.1-20 alkyl group provided that at least two of R.sub.6, R.sub.7 and R.sub.8 are alkyl groups). A photosensitive resin composition for lithographic printing comprising a diazo res…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.