Method and apparatus for making a predistorted reticle to compensate for lens distortions
US5308991A · kind A · utility
34Cited by
5References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 2, 1992 |
| Grant date | May 3, 1994 |
| Priority date | — |
| Expiry date | Jun 2, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for making predistorted masks or reticles which compensate for lens field errors for use in the fabrication of integrated circuit devices. The lens error is first expressed as distortion data. The data is used to produce correction terms which are applied to an interferometrically controlled stage which positions the mask or reticle beneath a writing tool. When the predistorted mask or reticle is used in conjunction with the lens for which the distortion data was obtained, an integrated circuit device is produced which does not incorporate the lens field errors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.