Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
US5310583A · kind A · utility
22Cited by
10References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1992 |
| Grant date | May 10, 1994 |
| Priority date | — |
| Expiry date | Nov 2, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/401
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Silicon and oxygen containing coatings are deposited by the chemical vapor deposition of hydrogen silsesquioxane in an environment comprising nitrous oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.