Gas seal for continuous chemical vapor deposition reactors
US5312490A · kind A · utility
7Cited by
1References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 29, 1992 |
| Grant date | May 17, 1994 |
| Priority date | — |
| Expiry date | Jan 29, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.