Photosensitive materials
US5314785A · kind A · utility
12Cited by
8References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1993 |
| Grant date | May 24, 1994 |
| Priority date | — |
| Expiry date | Mar 19, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.