Method of forming a relief image comprising amphoteric compositions
US5314789A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 1, 1991 |
| Grant date | May 24, 1994 |
| Priority date | — |
| Expiry date | Oct 1, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.