Method for fabricating superconducting materials and superconductive thin films
US5316585A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1990 |
| Grant date | May 31, 1994 |
| Priority date | — |
| Expiry date | Jul 24, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/786
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Chemical reactions of superconducting raw materials with active oxygen atoms and their charged particles are accelerated by using at least oxygen plasma in the fabrication process of a superconductive body. Thereby an ionic crystal is grown in a short time, which provides stable superconducting materials of high quality such as high critical temperature and low resistivity. In another aspect, a substrate is irradiated simultaneously with streams of vapor of metal elements, of which a superconductive body is to be composed, and a stream of gas of ions generated in a plasma chamber and film growth is effected while keeping the substrate at a temperature higher than 400.degree. C. to produce a ceramic type superconductive thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.