Thin film magnetic head and method of manufacturing the same
US5316617A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 5, 1993 |
| Grant date | May 31, 1994 |
| Priority date | — |
| Expiry date | May 5, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49032
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A thin film magnetic head comprising a substrate on which are successively formed a base layer, a lower magnetic film, a gap layer, an insulator layer, a conductor coil, an upper magnetic film, and a first mask, is manufactured by a method in which one or more of a gas which can be expressed by the general formula of CnHxFy (where n.gtoreq.1, x+y=2n+2, x>0, y>0, and x.gtoreq.y); and a gas which can be expressed by the general formula of CnHxFy (where n.gtoreq.1, x+y=2n+2, x.gtoreq.0, y.gtoreq.0, and x<y) is used. The structure of the magnetic head thus obtained is such that, at a height near the interface between the mask and the upper magnetic film provided therebelow, the angle defined by the side edge surfaces of the mask and the above-mentioned interface ranges from 75.degree. to 90.degree..
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.