Apparatus for cleaning a substrate with metastable helium
US5318654A · kind A · utility
15Cited by
10References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 1992 |
| Grant date | Jun 7, 1994 |
| Priority date | — |
| Expiry date | Jun 4, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for cleaning a surface includes first and second reaction containers, a holding apparatus for holding, in the second reaction container, a substance to be processed on the surface of which foreign matter is present, an apparatus for supplying helium gas into the first reaction container, an apparatus for generating helium ions, electrons, and metastable helium by exciting helium gas in the first reaction container, and an apparatus for separating the metastable helium generated in the first reaction container and for introducing the metastable helium into the second reaction container.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.